Item talk:Q166421

{

 "OpenAlex": {
   "display_name": "Electron Beam Lithography: Resolution and Applications",
   "description": "This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.",
   "keywords": [
     "Electron Beam Lithography",
     "Nanofabrication",
     "Resolution Limits",
     "Chemically Amplified Resists",
     "Extreme Ultraviolet Lithography",
     "Line Edge Roughness",
     "Nanolithography Techniques",
     "Patterning Materials",
     "High-Resolution Patterning",
     "Mask Design"
   ],
   "ids": {
     "openalex": "https://openalex.org/T11338",
     "wikipedia": "https://en.wikipedia.org/wiki/Electron-beam_lithography"
   },
   "subfield": {
     "id": "https://openalex.org/subfields/2208",
     "display_name": "Electrical and Electronic Engineering"
   },
   "field": {
     "id": "https://openalex.org/fields/22",
     "display_name": "Engineering"
   },
   "domain": {
     "id": "https://openalex.org/domains/3",
     "display_name": "Physical Sciences"
   },
   "updated_date": "2024-08-12T05:17:44.660016",
   "created_date": "2024-01-23",
   "type": "topic",
   "oa_id": "T11338",
   "id": "https://openalex.org/T11338"
 }

}