UES (United States) (Q335480)

From geokb

company organization in Dayton, United States

Language	Label	Description	Also known as
English	UES (United States)	company organization in Dayton, United States

Statements

0 references

addresses subject

Design and Applications of Intermetallic Alloys

185

1 reference

https://openalex.org/I4210158237

Ceramic Materials and Processing

183

1 reference

https://openalex.org/I4210158237

Nanomaterials and Mechanical Properties

130

1 reference

https://openalex.org/I4210158237

Metal Matrix Composites: Science and Applications

107

1 reference

https://openalex.org/I4210158237

Synthesis and Properties of Cemented Carbides

106

1 reference

https://openalex.org/I4210158237

Titanium Alloys for Biomedical Applications

94

1 reference

https://openalex.org/I4210158237

Mechanical Properties of Thin Film Coatings

94

1 reference

https://openalex.org/I4210158237

Nickel-Based Superalloys and High-Temperature Steels

91

1 reference

https://openalex.org/I4210158237

Dynamic Recrystallization in Metal Deformation Processes

83

1 reference

https://openalex.org/I4210158237

Wearable Nanogenerator Technology

74

1 reference

https://openalex.org/I4210158237

Thermal Barrier Coatings for Gas Turbines

69

1 reference

https://openalex.org/I4210158237

Aluminium Alloys for Aerospace and Automotive Applications

69

1 reference

https://openalex.org/I4210158237

Two-Dimensional Transition Metal Carbides and Nitrides (MXenes)

62

1 reference

https://openalex.org/I4210158237

4D Printing Technologies

52

1 reference

https://openalex.org/I4210158237

Atom Probe Tomography Research

48

1 reference

https://openalex.org/I4210158237

Mechanical Properties of Metallic Glasses

47

1 reference

https://openalex.org/I4210158237

Graphene: Properties, Synthesis, and Applications

45

1 reference

https://openalex.org/I4210158237

High-Entropy Alloys: Novel Designs and Properties

40

1 reference

https://openalex.org/I4210158237

Diamond Nanotechnology and Applications

39

1 reference

https://openalex.org/I4210158237

Plasma Physics and Technology in Semiconductor Industry

39

1 reference

https://openalex.org/I4210158237

Nuclear Fuel Development

39

1 reference

https://openalex.org/I4210158237

Two-Dimensional Materials

37

1 reference

https://openalex.org/I4210158237

Photonics and Optoelectronics of Lithium Niobate Crystals

37

1 reference

https://openalex.org/I4210158237

Liquid Crystal Research

37

1 reference

https://openalex.org/I4210158237

Silicon Photonics Technology

37

1 reference

https://openalex.org/I4210158237

coordinate location

39°45'32"N, 84°11'30"W

1 reference

https://openalex.org/I4210158237

United States of America

1 reference

https://openalex.org/I4210158237

official website

http://www.ues.com/

1 reference

https://openalex.org/I4210158237

0 references

Research Organization Registry ID

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