Atomic Layer Deposition Technology (Q166449)

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This cluster of papers focuses on the advances in atomic layer deposition (ALD) technology, particularly in the context of high-k dielectrics, gate oxides, and semiconductor devices
  • Atomic Layer Deposition
  • High-k Dielectrics
  • Gate Oxides
  • Semiconductor Devices
  • Nanoelectronics
  • Thin Film Growth
  • Dielectric Breakdown
  • Metal Gate Transistors
  • Interface Engineering
  • NBTI Degradation
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English
Atomic Layer Deposition Technology
This cluster of papers focuses on the advances in atomic layer deposition (ALD) technology, particularly in the context of high-k dielectrics, gate oxides, and semiconductor devices
  • Atomic Layer Deposition
  • High-k Dielectrics
  • Gate Oxides
  • Semiconductor Devices
  • Nanoelectronics
  • Thin Film Growth
  • Dielectric Breakdown
  • Metal Gate Transistors
  • Interface Engineering
  • NBTI Degradation

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