Atomic Layer Deposition Technology (Q166449): Difference between revisions
From geokb
(Changed label, description and/or aliases in en, and other parts: modified description with assistance from Llama 3.1) |
(Changed label, description and/or aliases in en, and other parts: removed aliases from OpenAlex keywords) |
||
| (One intermediate revision by the same user not shown) | |||
| aliases / en / 0 | aliases / en / 0 | ||
| aliases / en / 1 | aliases / en / 1 | ||
| aliases / en / 2 | aliases / en / 2 | ||
| aliases / en / 3 | aliases / en / 3 | ||
| aliases / en / 4 | aliases / en / 4 | ||
| aliases / en / 5 | aliases / en / 5 | ||
| aliases / en / 6 | aliases / en / 6 | ||
| aliases / en / 7 | aliases / en / 7 | ||
| aliases / en / 8 | aliases / en / 8 | ||
| aliases / en / 9 | aliases / en / 9 | ||
| Property / same as | |||
| Property / same as: https://openalex.org/T10472 / rank | |||
| Property / OpenAlex ID | |||
| Property / OpenAlex ID: T10472 / rank | |||
Normal rank | |||
Latest revision as of 20:32, 12 September 2024
Advanced thin film growth using precise layering for improved semiconductor device performance.
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Atomic Layer Deposition Technology |
Advanced thin film growth using precise layering for improved semiconductor device performance. |
